Substrates for soft X-ray microscopy based on Si3N4 membranes
Reunov D.G.1, Gusev N.S.1, Mikhailenko M.S.1, Petrova D.V.1, Malyshev I.V.1, Chkhalo N.I.1
1Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
Email: reunov_dima@ipmras.ru

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Silicon nitride membranes were experimentally obtained as substrates for biological samples, which are examined using a microscope with an operating wavelength of 13.8 nm. The free-hanging films obtained have a size of up to 1.5 x 1.5 mm2, which makes it possible to select an area of interest for investigation on the sample on the order of tens to hundreds of microns. The mechanical strength of the membranes satisfies that the samples do not tear the membranes and withstand transportation. The results obtained are an import-substituting technology for the manufacture of Si3N4 membranes. The resulting membranes have a transparency of more than 40% in the range of the "water transparency window" (2.3-4.4 nm) and EUV (13-15 nm). The developed technology will become the basis for creating cuvettes for living biological samples for soft X-ray microscopy studies. Keywords: Si3N4 membranes, photolithography, soft X-ray microscopy, EUV microscopy, correlation microscopy. DOI: 10.61011/TP.2023.07.56646.105-23
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