Chemical Vapor Deposition of Aluminum Oxide Thin Films Using Aluminum Isopropoxide as a Precursor
Mitulinsky A. S.1, Gaydaychuk A. V.1, Zenkin S. P.1, Linnik S. A.1
1Tomsk Polytechnic University, Tomsk, Russia
Email: mitulinsky@tpu.ru

PDF
The chemical vapor deposition process of aluminum oxide thin films using aluminum isopropoxide as a precursor was investigated. Deposition parameters enabling a high growth rate of up to ~ 0.94 μm/min were identified. The resulting coatings were found to have an amorphous structure, with subsequent annealing at 1200 oC inducing crystallization and the formation of α-Al2O3, kappa-Al2O3, and γ-Al2O3 phases. It was demonstrated that aluminum isopropoxide allows the synthesis of high-purity coatings at relatively low deposition temperatures. Keywords: chemical vapor deposition, thin films, aluminum oxide, thermal stability, thermal barrier coatings.
  1. F. Konstantiniuk, M. Tkadletz, C. Kainz, C. Czettl, N. Schalk, Surf. Coat. Technol., 410, 126959 (2021). DOI: 10.1016/j.surfcoat.2021.126959
  2. V. Teixeira, A. Monteiro, J. Duarte, A. Portinha, Vacuum, 67 (3-4), 477 (2002). DOI: 10.1016/S0042-207X(02)00235-X
  3. C.-S. Park, J.-G. Kim, J.S. Chun, J. Vac. Sci. Technol. A, 1 (4), 1820 (1983). DOI: 10.1116/1.572221
  4. C. Lin, T. Tanaka, A. Nishiyama, T. Shiota, O. Sakurai, N. Wakiya, K. Shinozaki, K. Yasuda, J. Ceram. Soc. J., 127 (6), 443 (2019). DOI: 10.2109/jcersj2.18192
  5. S. Yamashita, K. Watanuki, H. Ishii, Y. Shiba, M. Kitano, Y. Shirai, S. Sugawa, T. Ohmi, J. Electrochem. Soc., 158, H93 (2011). DOI: 10.1149/1.3517080
  6. P. Bory o, K. Lukaszkowicz, M. Szindler, J. Kubacki, K. Balin, M. Basiaga, J. Szewczenko, Vacuum, 131, 319 (2016). DOI: 10.1016/j.vacuum.2016.07.013
  7. W.L. Li, S.B. Tian, F. Zhu, Sci. World, 2013, 838374 (2013). DOI: 10.1155/2013/838374
  8. S. Carmona-Tellez, J. Guzman-Mendoza, M. Aguilar-Frutis, G. Alarcon-Flores, M. Garcia-Hipolito, M.A. Canseco, C. Falcony, J. Appl. Phys., 103 (3), 034105 (2008). DOI: 10.1063/1.2838467
  9. C. Liu, K. Shih, Y. Gao, F. Li, L. Wei, J. Soils Sediments, 12 (5), 724 (2012). DOI: 10.1007/s11368-012-0506-0
  10. B. Shi, L. Xie, B. Ma, Z. Zhou, B. Xu, L. Qu, Gels, 8 (11), 744 (2022). DOI: 10.3390/gels8110744
  11. P. Souza Santos, H. Souza Santos, S.P. Toledo, Mater. Res., 3 (4), 104 (2000). DOI: 10.1590/S1516-14392000000400003

Подсчитывается количество просмотров абстрактов ("html" на диаграммах) и полных версий статей ("pdf"). Просмотры с одинаковых IP-адресов засчитываются, если происходят с интервалом не менее 2-х часов.

Дата начала обработки статистических данных - 27 января 2016 г.

Publisher:

Ioffe Institute

Institute Officers:

Director: Sergei V. Ivanov

Contact us:

26 Polytekhnicheskaya, Saint Petersburg 194021, Russian Federation
Fax: +7 (812) 297 1017
Phone: +7 (812) 297 2245
E-mail: post@mail.ioffe.ru