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Mechanism of subnanosecond switching in eptron
Bokhan P. A.
1, Gugin P. P.
1, Zakrevsky D.E.1,2, Kim V. A.
1, Lavrukhin M. A.
1, Schweigert I. V.
1,3
1Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2Novosibirsk State Technical University, Novosibirsk, Russia
3Khristianovich Institute of Theoretical and Applied Mechanics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
2Novosibirsk State Technical University, Novosibirsk, Russia
3Khristianovich Institute of Theoretical and Applied Mechanics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
Email: bokhan@isp.nsc.ru, gugin@isp.nsc.ru, zakrdm@isp.nsc.ru, kim@isp.nsc.ru, lavrukhin@isp.nsc.ru, ivshweigert@gmail.com
The initial stage of breakdown in an eptron - a device based on capillary discharge and plasma cathode - has been studied. It is shown that in the general case the discharge develops in two stages due to different mechanisms of plasma generation in the capillary and cathode, which leads to reflection of ionization wave from weakly ionized plasma of the cathode. Artificial increase of its concentration brings both stages closer together and allows obtaining subnanosecond switching times. Keywords: breakdown, switching, nanoseconds, current development rate.
- P.A. Bokhan, P.P Gugin, M.A. Lavrukhin, D.E. Zakrevsky, J. Phys. D, 51, 364001 (2018). DOI: 10.1088/1361-6463/aad351
- P.A. Bokhan, E.V. Belskaya, P.P. Gugin, M.A. Lavrukhin, D.E. Zakrevsky, I.V. Schweigert, Plasma Sources Sci. Technol., 29, 084001 (2020). DOI: 10.1088/1361-6595/ab9d91
- P.A. Bokhan, P.P. Gugin, D.E. Zakrevsky, M.A. Lavrukhin, Tech. Phys. Lett., 50 (10), 5 (2024). DOI: 10.61011/TPL.2024.10.59684.19992
- M.A. Lavrukhin, P.A. Bokhan, P.P. Gugin, D.E. Zakrevsky, Opt. Laser Technol., 149, 107625 (2022). DOI: 10.1016/j.optlastec.2021.107625; ibid. 170, 110174 (2024). DOI: 10.1016/j.optlastec.2023.110174
- A.A. Yurkin, Quantum Electron., 46, 201 (2016). DOI: 10.1070/QEL15754
- [A.A. Yurkin, Instrum. Exp. Tech., 65 (5), 755 (2022). DOI: 10.1134/s0020441222050104
- R. Brandenburg, Plasma Sources Sci. Technol., 26, 053001 (2017). DOI: 10.1088/1361-6595/aa6426
- Pulsed discharge plasmas. Characteristics and applications, ed. by T. Chao, Ch. Zhang (Springer, 2023). DOI: 10.1007/978-981-99-1141-7
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