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Ni-based multilayer structures for Goebel-type mirrors
Durov K. V.
1, Polkovnikov V. N.1, Chkhalo N. I.1, Akhsakhalyan A. A.1, Malyshev I. V.1
1Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
Email: zevs2801@mail.ru
In this work, the characteristics of the Ni80Mo20/Si multilayer structure, which is promising for the manufacture of Goebel mirrors, were studied for the first time. The structural parameters of the multilayer structure were determined. It is shown that the values of the transition regions for σ(Ni80Mo20) and σ(Si) are 5 and 8.5 Angstrem angstroms, respectively. The composition of the structures was found at which the best reflectivity R=69.5-56.1% was achieved for periods of 41.5-32 Angstrem angstroms. Keywords: multilayer X-ray mirrors, magnetron sputtering, Goebel mirrors.
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