Comparative investigation of GaAsSb/InGaAs type-II and InP/InGaAs type-I doped--channel field--effect transistors
Wu Yi-Chen1, Tsai Jung-Hui2, Chiang Te-Kuang1, Chiang Chung-Cheng2, Wang Fu-Min1
1Department of Electrical Engineering, National University of Kaohsiung, 811 Kaohsiung, Taiwan
2Department of Electronic Engineering, National Kaohsiung Normal University, 824 Kaohsiung County, Taiwan
Поступила в редакцию: 1 апреля 2014 г.
Выставление онлайн: 20 января 2015 г.
DC performance of GaAsSb/InGaAs type-II and InP/InGaAs type-I doped-channel field-effect transistors (DCFETs) is demonstrated and compared by two-dimensional simulated analysis. As compared with the traditional InP/InGaAs DCFET, the GaAsSb/InGaAs DCFET exhibits a higher drain current of 8.05 mA, a higher transconductance of 216.24 mS/mm, and a lower gate turn-on voltage of 0.25 V for the presence of a relatively large conduction band discontinuity (Delta Ec~0.4 eV) at GaAsSb/InGaAs heterostructure and the formation of two-dimensional electron gas in the n +-InGaAs doping channel. However, due to the tunneling effect under large gate-to-source bias, it results in considerably large gate leakage current in the GaAsSb/InGaAs DCFET.
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