Residual resistance and Joule heat generation in bulk samples and nanostructures
Gurevich V. L.1
1Ioffe Physicotechnical Institute, Russian Academy of Sciences, St. Petersburg, Russia
Поступила в редакцию: 6 февраля 2008 г.
Выставление онлайн: 20 июля 2008 г.
The Joule heat generation under residual resistance conditions in bulk samples of metals and degenerate semiconductors is discussed. We assume that the conductance of the system is determined by elastic scattering of conduction electrons and consider Ohmic regime. We come to conclusion that the amount of Joule heat generated in such a system is determined by the residual resistance provided the length of phase coherence of the electron wave functions is smaller than the dimensions of the sample. For a quantum well this condition is imposed on its lateral dimensions and does not concern its width. It is indicated that this is only a sufficient condition that can be relaxed by further investigations. PACS: 44.90.+c, 65.40.Gr, 73.23.Ad
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